Shinya Ebata

Title: Shinya Ebata: Innovator in Semiconductor Processing

Introduction

Shinya Ebata is a prominent inventor based in Toyama, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 11 patents. His innovative approaches have advanced the technology used in manufacturing semiconductor devices.

Latest Patents

Ebata's latest patents include a method of processing substrates, a method of manufacturing semiconductor devices, a substrate processing apparatus, and a recording medium. One of his notable methods involves forming a film on a substrate through a cycle that includes non-simultaneous steps of forming a first layer and a second layer. This process utilizes a combination of precursor and reactant supplies, along with controlled inert gas flows to optimize the film formation. Additionally, he has developed an apparatus and method for cleaning reaction vessels used in substrate processing, which enhances the efficiency and effectiveness of the cleaning process.

Career Highlights

Throughout his career, Shinya Ebata has worked with leading companies in the semiconductor industry, including Kokusai Electric Corporation and Hitachi Kokusai Electric Inc. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Ebata has collaborated with notable colleagues such as Hiroaki Hiramatsu and Toru Kagaya. These partnerships have fostered a creative environment that has led to innovative solutions in semiconductor processing.

Conclusion

Shinya Ebata's contributions to semiconductor processing through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.