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For the Inventor, By the Inventor

Osaka, Japan

Shingo Fujita

This inventor holds 15 USPTO granted patents. Top assignee: Sumitomo Chemical Company, Limited. Active years: 2013-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shingo Fujita. Retrieved from https://idiyas.com/inventor/shingo-fujita-dhet9wz2

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 15

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 23(Granted Patents)


Company Filing History:

goldMedal15 out of 6,964 
 
Sumitomo Chemical Company, Limited
 patents

Years Active: 2013-2023

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15 patents (USPTO):Explore Patents
1. 11681224 - Resin, resist composition and method for producing resist pattern (2023-06-20),
2. 11500288 - Resin, resist composition and method for producing resist pattern (2022-11-15),
3. 11353790 - Resin, resist composition and method for producing resist pattern (2022-06-07),
4. 10915022 - Photoresist composition and process for producing photoresist pattern (2021-02-09),
5. 10795258 - Resist composition (2020-10-06),
6. 9760005 - Salt, acid generator, resist composition and method for producing resist pattern (2017-09-12),
7. 9740102 - Photoresist composition and method for producing photoresist pattern (2017-08-22),
8. 9671693 - Resist composition and method for producing resist pattern (2017-06-06),
9. 9638997 - Resist composition and method for producing resist pattern (2017-05-02),
10. 9563123 - Photoresist composition, compound and process of producing photoresist pattern (2017-02-07),
11. 9233945 - Compound, resin and photoresist composition (2016-01-12),
12. 8921029 - Resist composition and method for producing resist pattern (2014-12-30),
13. 8663900 - Resist composition and method for producing resist pattern (2014-03-04),
14. 8617790 - Photoresist composition and method for producing photoresist pattern (2013-12-31),
15. 8420294 - Salt and photoresist composition comprising the same (2013-04-16),

Title: Shingo Fujita: Innovator in Resin Technology

Introduction

Shingo Fujita is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of resin technology, holding a total of 15 patents. His work focuses on developing advanced materials and methods that enhance the production of resist patterns.

Latest Patents

Fujita's latest patents include innovative formulations for resins and resist compositions. One of his notable patents discloses a resin containing various structural units, which are essential for producing resist patterns. Another patent details a resin that includes specific structural units, emphasizing the versatility of the materials he develops. These inventions are crucial for advancements in semiconductor manufacturing and other applications requiring precise resist patterns.

Career Highlights

Shingo Fujita is currently employed at Sumitomo Chemical Company, Limited, where he continues to push the boundaries of resin technology. His expertise and innovative approach have positioned him as a key figure in his field. Fujita's work not only contributes to his company but also to the broader scientific community.

Collaborations

Throughout his career, Fujita has collaborated with talented individuals such as Koji Ichikawa and Tatsuro Masuyama. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Shingo Fujita's contributions to resin technology and his impressive portfolio of patents highlight his role as an influential inventor. His work continues to impact various industries, paving the way for future innovations in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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