logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11500288 B1

PDFFull Text
Date of Patent:
Nov. 15, 2022

Filed:

Jan. 14, 2020

Resin, resist composition and method for producing resist pattern

Applicant:

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Mutsuko Higo, Osaka, JP;

Shingo Fujita, Osaka, JP;

Koji Ichikawa, Osaka, JP;

Assignee:

SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;

Attorney:

Buchanan Ingersoll & Rooney PC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 212/14 (2006.01); C08F 220/38 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 212/22 (2020.02); C08F 212/24 (2020.02); C08F 220/1818 (2020.02); C08F 220/281 (2020.02); C08F 220/282 (2020.02); C08F 220/38 (2013.01); C08F 220/382 (2020.02); G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract

Disclosed is a resin including a structural unit represented by formula (I) and a structural unit represented by formula (a2-A), and a resist composition: wherein Rrepresents a hydrogen atom or a methyl group; Land Leach represent —O— or —S—; s1 represents an integer of 1 to 3; s2 represents an integer of 0 to 3; Rrepresents a hydrogen atom, a halogen atom, or an alkyl group which may have a halogen atom; Rrepresents a halogen atom, a hydroxy group, an alkyl group, an alkoxy group, an alkylcarbonyl group or the like; Arepresents a single bond or *—X-(A-X)—; Arepresents an alkanediyl group; Xand Xeach represent —O—, —CO—O— or —O—CO—; nb represents 0 or 1; and mb represents an integer of 0 to 4.

Find Patent Forward Citations

Loading…