The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2017
Filed:
Mar. 02, 2015
Applicant:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Inventors:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/38 (2006.01); C07D 321/10 (2006.01); C07C 71/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C07C 71/00 (2013.01); C07D 321/10 (2013.01); G03F 7/0045 (2013.01); G03F 7/38 (2013.01); C07C 2101/14 (2013.01); C07C 2103/74 (2013.01);
Abstract
A photoresist composition comprising: wherein R, Rand Reach independently represents a C1-C24 hydrocarbon group in which a hydrogen atom can be replaced by a substituent and in which a methylene group can be replaced by an oxygen atom, a sulfur atom or a carbonyl group.
Masuyama, Tatsuro. (2017). Photoresist composition, compound and process of producing photoresist pattern (U.S. Patent No. 9563123). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9563123
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile