Location History:
- Shin-Chu, TW (1998)
- Hsin-Chu, TW (1999 - 2001)
- Hsin hu, TW (2009)
Company Filing History:
Years Active: 1998-2009
Title: Shing-Long Lee: Innovator in Plasma Treatment Technologies
Introduction
Shing-Long Lee is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in plasma treatment technologies. With a total of 6 patents to his name, Lee's work has advanced the capabilities of semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Method and apparatus for dynamic plasma treatment of bipolar ESC system." This invention relates to a method for plasma etching a substrate in a plasma reactor. The process involves positioning the substrate on an electrostatic chuck, supplying a DC voltage to create an electrostatic charge, and utilizing a varying RF signal to counteract the charge buildup during etching.
Another notable patent is "Method for forming a delamination resistant multi-layer dielectric layer for passivating a conductor layer." This method outlines a process for forming a microelectronic fabrication that includes creating a patterned aluminum containing conductor layer and applying a conformal dielectric liner layer. The innovative use of etchant gas compositions in this method helps to mitigate delamination issues in the final product.
Career Highlights
Shing-Long Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has positioned him as a key player in advancing semiconductor technologies. His expertise in plasma treatment and microelectronic fabrication has been instrumental in enhancing manufacturing processes.
Collaborations
Lee has collaborated with notable colleagues, including Julie Huang and Chia Shiung Tsai. These partnerships have fostered innovation and contributed to the successful development of new technologies in the semiconductor field.
Conclusion
Shing-Long Lee's contributions to plasma treatment technologies and microelectronics have established him as a significant inventor in his field. His innovative patents and work at Taiwan Semiconductor Manufacturing Company Limited continue to influence the semiconductor industry.