Location History:
- Chang Hwa, TW (1999 - 2000)
- Hsinchu, TW (2000 - 2001)
Company Filing History:
Years Active: 1999-2001
Title: Innovations of Inventor Shih-Ming Lan
Introduction
Shih-Ming Lan is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of six patents. His work focuses on methods that enhance the efficiency and effectiveness of manufacturing processes in the industry.
Latest Patents
Among his latest patents is a method of manufacturing shallow trench isolation. This innovative method involves providing a substrate with a pad oxide and a silicon nitride layer, followed by the formation of a trench that penetrates through these layers. A first oxide layer is conformally formed, and a rapid thermal process is performed to create a second oxide layer that fills the trench. This process ultimately exposes the silicon nitride layer, showcasing a novel approach to shallow trench isolation.
Another notable patent is a method for forming an insulating film. This method addresses the issue of non-uniform thickness in insulating layers. It includes the formation of a first insulating layer over a substrate using chemical vapor deposition (CVD) at specific temperatures. A second insulating layer is then formed over the first, ensuring that both layers work together to insulate transistors and isolation structures from the interconnect metal layer.
Career Highlights
Shih-Ming Lan is currently associated with United Silicon Incorporated, where he continues to innovate and develop new technologies. His expertise in semiconductor processes has positioned him as a valuable asset in the industry.
Collaborations
He has collaborated with notable coworkers, including Hsien-Liang Meng and Chun-Liang Liu, contributing to various projects that advance semiconductor technology.
Conclusion
Shih-Ming Lan's contributions to semiconductor manufacturing through his innovative patents demonstrate his commitment to advancing technology in this critical field. His work continues to influence the industry and inspire future innovations.