Shigeru Shirayone

Title: Innovations of Shigeru Shirayone in Plasma Processing Technology

Introduction

Shigeru Shirayone, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of plasma processing technology. With a total of 12 patents to his name, Shirayone's work focuses on advancing the capabilities and efficiency of plasma processing apparatuses. His inventions aim to enhance the etching profiles and yield rates in various industrial applications.

Latest Patents

Shirayone's latest inventions include two notable patents for plasma processing apparatuses. The first patent describes a plasma processing apparatus capable of obtaining desired etch profiles while preventing yield degradation caused by particle adhesion. This apparatus features a processing chamber for plasma treatment, a radio-frequency power source for generating plasma, a sample stage with electrodes for electrostatic sample mounting, and a DC power supply for controlling voltages to the electrodes. Furthermore, it is equipped with a control apparatus to optimize the DC voltages applied during the absence of plasma.

The second patent also details a plasma processing apparatus comprising a plasma processing chamber and a radio frequency power source. It includes a sample stage and an electrode that securely chucks the sample electrostatically. The invention highlights a DC power source that applies voltage to the electrode and a control device that manages the output voltage to maintain an optimal electric potential difference, which is essential during interruptions in plasma discharge.

Career Highlights

Throughout his career, Shigeru Shirayone has been associated with key companies that contribute to technological advancement. Notably, he worked with Hitachi High-Tech Corporation and Hitachi High-Technologies Corporation, where he collaborated on various innovative projects in the realm of plasma technology.

Collaborations

During his professional journey, Shirayone has worked alongside esteemed colleagues such as Masaki Ishiguro and Kazuyuki Ikenaga. These collaborations have further enriched his inventions and the overall development of plasma processing technologies.

Conclusion

Shigeru Shirayone exemplifies the spirit of innovation in the field of plasma processing technology. Through his groundbreaking patents and collaborations with major technology firms, he has established himself as a key inventor contributing to advancements that enhance industrial processes. His work continues to influence the future of plasma technology, ensuring efficiency and reliability in various applications.