The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2011
Filed:
Apr. 05, 2007
Tooru Aramaki, Kudamatsu, JP;
Tsunehiko Tsubone, Hikari, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Shigeru Shirayone, Shuunan, JP;
Hideki Kihara, Kudamatsu, JP;
Tooru Aramaki, Kudamatsu, JP;
Tsunehiko Tsubone, Hikari, JP;
Tadamitsu Kanekiyo, Kudamatsu, JP;
Shigeru Shirayone, Shuunan, JP;
Hideki Kihara, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A vacuum processing method includes mounting a sample to be processed on a sample mounting surface on a sample holder placed in a vacuum container whose inside can be depressurized, feeding a processing gas and electric field to a space above the sample holder inside of the vacuum container to generate plasma, and etching films of a plurality of layers laid over the surface of the sample into a predetermined shape. A heat conducting gas is fed between the sample mounting surface and the backside of the sample, and at the same time, the pressure of the heat conducting gas is changed stepwise in accordance with the progress of the processing of the films of a plurality of layers of the sample.