Location History:
- New Taipei, TW (2018 - 2022)
- Hsinchu, TW (2021 - 2024)
Company Filing History:
6 out of 40,635 
4 out of 97 Years Active: 2018-2025
Title: The Innovations of Sheng-Lin Hsieh: Pioneering Semiconductor Technologies
Introduction: Sheng-Lin Hsieh, an accomplished inventor based in New Taipei, Taiwan, has made significant contributions to the field of semiconductor technology. With a portfolio of five patents, his work focuses on enhancing the efficiency and performance of semiconductor devices through innovative processes. His latest patents reflect cutting-edge advancements in photoresist techniques, showcasing his expertise and commitment to advancing the industry.
Latest Patents: Among his notable inventions, Sheng-Lin Hsieh has developed a trench etching process aimed at improving the roughness of photoresist lines. This method involves forming a resist structure over a substrate, which comprises an anti-reflective coating (ARC) layer and a photoresist layer. The innovation includes patterning the photoresist layer to create a trench and performing a hydrogen plasma treatment designed to smooth the trench's sidewalls. Importantly, this step is conducted without etching the ARC layer, ensuring the integrity of the structure. This patented methodology plays a crucial role in enhancing the quality of semiconductor device fabrication.
Career Highlights: Throughout his career, Sheng-Lin Hsieh has collaborated with industry giants such as Taiwan Semiconductor Manufacturing Company Limited (TSMC) and TSMC Nanjing Company, Limited. His experience with these leading organizations has greatly influenced his developments and innovations in semiconductor technologies.
Collaborations: In his journey as an inventor, Sheng-Lin Hsieh has worked alongside talented colleagues including I-Chih Chen and Chih-Mu Huang. Their collaborations have likely fostered an environment of creativity and innovation, contributing to the success of their collective endeavors in the semiconductor industry.
Conclusion: Sheng-Lin Hsieh stands out as a prominent inventor in semiconductor technology, with a focus on improving fabrication processes through innovative approaches. His contributions, including the recent trench etching process, demonstrate his commitment to excellence and progress within the field. As technologies continue to evolve, Hsieh's work serves as a testament to the vital role of innovation in shaping the future of semiconductor devices.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.