Shannon W Dunn

Title: Innovations of Inventor Shannon W Dunn

Introduction

Shannon W Dunn is a notable inventor based in Altamont, NY (US). He holds a total of 12 patents that showcase his contributions to the field of technology and innovation. His work primarily focuses on advanced methods for patterning substrates, which are crucial in various manufacturing processes.

Latest Patents

Among his latest patents, one is titled "Double patterning with inline critical dimension slimming." This patent describes a method for double patterning a substrate using a litho/freeze/litho/etch (LFLE) technique. The process includes a first critical dimension (CD) slimming to reduce the first CD to a first reduced CD, followed by a second CD slimming to achieve a second reduced CD. Another significant patent is "Sidewall image transfer pitch doubling and inline critical dimension slimming." This method involves performing a lithographic process to create a pattern and subsequently reducing a CD in the pattern to a reduced CD. The pattern is then doubled using a sidewall image transfer technique.

Career Highlights

Shannon has worked with prominent companies in the industry, including Tokyo Electron Limited. His experience in these organizations has significantly contributed to his expertise and the development of his innovative patents.

Collaborations

Shannon has collaborated with talented individuals such as Dave Hetzer and Sandra L Hyland, who have contributed to his projects and innovations.

Conclusion

Shannon W Dunn's work exemplifies the spirit of innovation in technology, with his patents reflecting significant advancements in substrate patterning methods. His contributions continue to influence the industry and inspire future innovations.