The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2010
Filed:
Sep. 22, 2006
Applicant:
Shannon W. Dunn, Altamont, NY (US);
Inventor:
Shannon W. Dunn, Altamont, NY (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/22 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for double patterning a thin film on a substrate is described. The method includes forming the thin film to be patterned on the substrate, forming a developable anti-reflective coating (ARC) layer on the thin film, and forming a layer of photo-resist on the ARC layer. Thereafter, the layer of photo-resist and the ARC layer are double imaged, and developed. Once the layer of photo-resist is optionally removed, a double patterned ARC layer remains for etching the underlying thin film.
Dunn, Shannon. (2010). Method for double imaging a developable anti-reflective coating (U.S. Patent No. 7858293). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7858293
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile