Suwon, South Korea

Seunggeol Nam

This inventor holds 51 USPTO granted patents and 40 published patent applications and 8 EPO patents, primarily in Semiconductor Devices. Top assignees: Samsung Electronics Co., Ltd., Samsung Electronics Ltd., Ulsan National Institute of Science and Technology. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seunggeol Nam. Retrieved from https://idiyas.com/inventor/seunggeol-nam

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 51 

% Patents Active = 98.0

 

Average Co-Inventor Count = 5.3

ph-index = 3

Forward Citations = 33(Granted Patents)


Location History:

  • Suwon-si, KR (2018 - 2024)
  • Yongin-si, KR (2019 - 2024)

Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
Ferroelectric Device
Graphene Integration
Nonvolatile Memory
Thin Film Structure
Boron Nitride Layer
Transistor Design
Two-Dimensional Material
Interconnect Structure
Capacitor Device
Memory Device
Semiconductor Element
Dielectric Layer
51 patents (USPTO):Explore Patents

Title: **Seunggeol Nam: Innovator in Layer Structures and Graphene Technologies**

Introduction

Seunggeol Nam, a prolific inventor based in Suwon-si, South Korea, has made significant strides in the field of electronic device architecture and materials science. With an impressive portfolio of 37 patents, Nam’s work focuses primarily on the innovative design and manufacturing of layer structures, particularly those that incorporate advanced dielectric materials.

Latest Patents

Among his latest patents, Nam has disclosed a **layer structure including a dielectric layer**, featuring a lower layer, a dielectric layer, and an upper layer that are sequentially stacked. This dielectric layer is composed of three distinct layers: one acts as a ferroelectric, the other as an anti-ferroelectric, complemented by an oxide layer. In certain implementations, a fourth layer may also be added on top of the third layer. Another noteworthy patent details a **method of pre-treating a substrate** that enables the direct formation of graphene, utilizing a pre-treatment gas that includes both a carbon source and hydrogen. These inventions highlight Nam's ability to blend material science with practical application in electronics.

Career Highlights

Seunggeol Nam has contributed significantly to his field through his roles in various esteemed organizations, notably Samsung Electronics Co., Ltd. and the Ulsan National Institute of Science and Technology (UNIST). His career has been marked by a commitment to research and development, pushing the boundaries of existing technologies to cultivate new innovations.

Collaborations

Throughout his journey, Nam has had the privilege of collaborating with talented individuals such as Hyeonjin Shin and Seongjun Park. These partnerships have broadened the scope of his work and have led to noteworthy contributions in their respective fields.

Conclusion

Seunggeol Nam stands as a testament to the impact of innovative thought and dedication in the realm of inventions. With a robust portfolio of patents and a history of collaboration with leading organizations and talented researchers, his work continues to influence the development of next-generation electronic devices and materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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