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For the Inventor, By the Inventor

Seoul, South Korea

Seok-Hwan Oh

USPTO Granted Patents = 11 

Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 21(Granted Patents)


Location History:

  • Youngin, KR (2006)
  • Yongin-si, KR (2004 - 2009)
  • Gyeonggi-do, KR (2009)
  • Seoul, KR (2012 - 2018)

Company Filing History:

goldMedal11 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2004-2018

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11 patents (USPTO):Explore Patents
1. 9885953 - Method of manufacturing a mask (2018-02-06),
2. 9256124 - Apparatus for manufacturing a mask (2016-02-09),
3. 8930011 - Method of measuring an overlay of an object (2015-01-06),
4. 8735053 - Methods of forming photoresist patterns (2014-05-27),
5. 8492058 - Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus (2013-07-23),
6. 8338063 - Photolithography method including technique of determining distribution of energy of exposure light passing through slit of exposure apparatus (2012-12-25),
7. 8227349 - Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same (2012-07-24),
8. 7604907 - Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets (2009-10-20),
9. 7582899 - Semiconductor device having overlay measurement mark and method of fabricating the same (2009-09-01),
10. 7027636 - Method of detecting measurement error in measurement system (2006-04-11),
11. 6803292 - Method for manufacturing a semiconductor device and semiconductor device with overlay mark (2004-10-12),

Title: The Innovative Contributions of Seok-Hwan Oh

Introduction

Seok-Hwan Oh is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of technology, particularly in the area of mask manufacturing. With a total of 11 patents to his name, Oh continues to push the boundaries of innovation.

Latest Patents

Seok-Hwan Oh's latest patents include a method of manufacturing a mask. This method involves dividing the upper surface of a template with a design pattern into multiple regions. The template is arranged over a polymer layer on a mask substrate. It also includes correcting any distorted regions, pressing the polymer layer with the template to form a mask pattern, and curing the mask pattern. Another patent focuses on an apparatus for manufacturing a mask, which follows a similar process to ensure precision and quality in mask production.

Career Highlights

Oh is currently employed at Samsung Electronics Co., Ltd., where he applies his expertise in innovative technologies. His work has been instrumental in advancing manufacturing techniques that enhance product quality and efficiency.

Collaborations

Throughout his career, Seok-Hwan Oh has collaborated with notable colleagues, including Jeong-Ho Yeo and Jin-seok Heo. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Seok-Hwan Oh's contributions to the field of mask manufacturing exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of technology and a drive to improve manufacturing processes.

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