Location History:
- Ota-ku, JP (2010 - 2013)
- Tokyo, JP (2008 - 2020)
Company Filing History:
9 out of 1,559 
3 out of 90 
1 out of 4,240 
Years Active: 2008-2020
Title: Seiji Harada: Innovator in Gettering Layer Technology
Introduction
Seiji Harada is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His innovative work primarily focuses on methods for forming gettering layers, which are crucial in enhancing the performance of semiconductor devices.
Latest Patents
Among his latest patents, Seiji Harada has developed a gettering layer forming method that includes a coating step of applying a solution of metal salt to the back side of a wafer. This is followed by a diffusing step, where the wafer is heated to diffuse the metal salt, resulting in a gettering layer containing the metal salt on the back side of the wafer. Another notable patent involves a similar gettering layer forming method, which includes a coating step and a drying step to form the gettering layer on the wafer.
Career Highlights
Throughout his career, Seiji Harada has worked with notable companies such as Disco Corporation and Sumitomo Mitsubishi Silicon Corporation. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the field.
Collaborations
Seiji has collaborated with esteemed colleagues, including Toru Taniguchi and Isoroku Ono. Their joint efforts have further propelled innovation in the semiconductor industry.
Conclusion
Seiji Harada's contributions to gettering layer technology have established him as a key figure in the semiconductor field. His innovative patents and collaborations reflect his commitment to advancing technology and improving semiconductor performance.