Location History:
- Kudamatsu, JP (2011 - 2012)
- Tokyo, JP (2019 - 2023)
Company Filing History:
4 out of 2,874 
3 out of 1,125 
Years Active: 2011-2025
Title: Satoshi Une: Innovator in Plasma Processing Technology
Introduction
Satoshi Une is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing, holding a total of 7 patents. His innovative approaches have advanced the technology used in various industrial applications.
Latest Patents
One of Satoshi Une's latest patents is a plasma processing method aimed at preventing the generation of deposition from an underlying metal film. This method achieves an anisotropic shape in hard mask etching. The process involves a first step of etching using plasma generated by a mixed gas containing O2, CHF3, NF3, Ar, and He, while supplying pulse-modulated radio frequency power to a sample stage. Following this, a second step of etching is performed with continuous wave (CW) radio frequency power. The film to be etched includes a TEOS film and a silicon nitride film, with specific power parameters to ensure optimal results.
Another notable patent by Une involves a plasma processing method where plasma etching is performed on a film using a mask. This method includes a deposition step that deposits a film containing a boron element on the mask, followed by an etching step using plasma. This innovative approach enhances the efficiency and effectiveness of the etching process.
Career Highlights
Satoshi Une has worked with notable companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in plasma processing.
Collaborations
Throughout his career, Satoshi Une has collaborated with esteemed colleagues, including Masamichi Sakaguchi and Masunori Ishihara. These partnerships have fostered a creative environment that has led to significant advancements in their field.
Conclusion
Satoshi Une's contributions to plasma processing technology are noteworthy, with a solid portfolio of patents that reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements.