Tokyo, Japan

Satoru Yamaki

USPTO Granted Patents = 39 

 

Average Co-Inventor Count = 5.8

ph-index = 11

Forward Citations = 1,517(Granted Patents)


Location History:

  • Ohta-ku, JP (2011)
  • Toyko, JP (2016)
  • Tokyo, JP (2014 - 2024)

Company Filing History:


Years Active: 2011-2025

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39 patents (USPTO):Explore Patents

Title: Innovations by Satoru Yamaki in Substrate Processing Technology

Introduction

Satoru Yamaki, an esteemed inventor based in Tokyo, Japan, has made significant contributions to substrate processing technology. With a total of 39 patents to his name, his work primarily focuses on enhancing the efficiency and precision of substrate handling and polishing methods. His innovative mindset has paved the way for advancements in the semiconductor industry.

Latest Patents

Yamaki's repertoire of recent patents showcases his expertise and innovative approach. Some of his latest patents include:

1. **Substrate Holding Apparatus**: This invention features a top ring main body that accommodates an elastic film capable of sucking a substrate. It includes a pressure adjuster to manage fluid flow and a determiner for substrate suction determination.

2. **Substrate Suction Determination Method**: A method to evaluate the effectiveness of a substrate's adhesion to the elastic film.

3. **Substrate Polishing Apparatus**: This apparatus polishes surfaces by utilizing a substrate holder in contact with a polishing surface while incorporating a tiltable retaining ring for improved uniformity.

4. **Substrate Polishing Method**: An innovative technique for conducting substrate polishing with optimized pressure and contact dynamics.

5. **Method of Removing Liquid from Upper Surface of Wafer to be Polished**: A specific method aimed at enhancing the prep of wafers before polishing.

6. **Elastic Film for Pressing Wafer Against Polishing Pad**: This film plays an essential role in improving the contact between the polishing pad and wafer.

7. **Substrate Release Method**: A technique designed to effectively detach substrates from their holding apparatus.

8. **Constant Amount Gas Supply Apparatus**: This invention ensures a steady supply of gas, enhancing the efficiency of substrate handling.

Career Highlights

Satoru Yamaki's role at Ebara Corporation highlights his dedication to innovation in substrate technologies. His pioneering work in designing apparatuses and methods for substrate processing has positioned him as a key figure in the field.

Collaborations

Throughout his career, Yamaki has collaborated with notable colleagues such as Makoto Fukushima and Osamu Nabeya. Their collective efforts have driven advancements in substrate technology, showcasing the importance of teamwork in the innovation process.

Conclusion

Satoru Yamaki's significant contributions to substrate processing technologies through his numerous patents reflect a commitment to innovation and excellence. His work continues to impact the semiconductor industry positively, demonstrating the vital role that inventors play in advancing technology.

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