The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2023

Filed:

Dec. 19, 2019
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Shingo Togashi, Tokyo, JP;

Makoto Fukushima, Tokyo, JP;

Keisuke Namiki, Tokyo, JP;

Osamu Nabeya, Tokyo, JP;

Satoru Yamaki, Tokyo, JP;

Tomoko Owada, Tokyo, JP;

Yoshikazu Kato, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 37/32 (2012.01); B24B 37/20 (2012.01);
U.S. Cl.
CPC ...
B24B 37/20 (2013.01); B24B 37/32 (2013.01);
Abstract

The polishing apparatus includes: a polishing table configured to support a polishing pad having a polishing surface; a rotatable head body having a pressing surface; a retainer ring configured to press the polishing surface and rotatable together with the head body; a rotary ring; a stationary ring; and local-load exerting devices each configured to apply a local load to the stationary ring. The local-load exerting devices include a first pressing member and a second pressing member coupled to the stationary ring. The first pressing member is arranged at an upstream side of the retainer ring in a moving direction of the polishing surface, and the second pressing member is arranged at a downstream side of the retainer ring in the moving direction of the polishing surface.


Find Patent Forward Citations

Loading…