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For the Inventor, By the Inventor

Falls Church, VA, United States of America

Sandra L Hyland

This inventor holds 9 USPTO granted patents and 1 EPO patent. Top assignees: Tokyo Electron Limited, Bae Systems Information and Electronic Systems Integration Inc., Other. Active years: 2002-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sandra L Hyland. Retrieved from https://idiyas.com/inventor/sandra-l-hyland

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9

% Patents Active = 33.3


Average Co-Inventor Count = 2.8

ph-index = 5

Forward Citations = 72(Granted Patents)


Location History:

  • Guilderland, NY (US) (2010 - 2011)
  • Falls Church, VA (US) (2002 - 2016)

Company Filing History:

goldMedal7 out of 10,883 
 
Tokyo Electron Limited
 patents
silverMedal1 out of 1,863 
 
Bae Systems Information and Electronic Systems Integration Inc.
 patents
bronzeMedal1 out of 834,453 
Other
 patents

Years Active: 2002-2016

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9 patents (USPTO):Explore Patents
1. 9255345 - Method for growing germanium/silicon—germanium superlattice (2016-02-09),
2. 8580075 - Method and system for introduction of an active material to a chemical process (2013-11-12),
3. 7883835 - Method for double patterning a thin film (2011-02-08),
4. 7811747 - Method of patterning an anti-reflective coating by partial developing (2010-10-12),
5. 7723237 - Method for selective removal of damaged multi-stack bilayer films (2010-05-25),
6. 7461614 - Method and apparatus for improved baffle plate (2008-12-09),
7. 7432191 - Method of forming a dual damascene structure utilizing a developable anti-reflective coating (2008-10-07),
8. 7226868 - Method of etching high aspect ratio features (2007-06-05),
9. 6376262 - Method of forming a semiconductor device using double endpoint detection (2002-04-23),

Title: Innovations of Sandra L Hyland

Introduction

Sandra L Hyland is a prominent inventor based in Falls Church, VA (US). She has made significant contributions to the field of materials science and chemical processes, holding a total of 9 patents. Her work focuses on overcoming challenges in semiconductor manufacturing and enhancing chemical processes.

Latest Patents

One of her latest patents is a method for growing germanium/silicon-germanium superlattice. This innovative bulk manufacturing method utilizes an ultra-high vacuum-chemical vapor deposition (UHV-CVD) system. It addresses the stress caused by the lattice mismatch between silicon and germanium, leading to uniform, defect-free layer-by-layer growth. The method involves flushing hydrogen between layer growths to create abrupt junctions between superlattice structure layers. Additionally, she has developed a method and system for introducing an active material to a chemical process. This system includes a processing element with a passive component that erodes to expose an active component, altering the chemical process as it proceeds.

Career Highlights

Throughout her career, Sandra has worked with notable companies, including Tokyo Electron Limited. Her expertise in semiconductor technology and chemical processes has positioned her as a leader in her field.

Collaborations

Sandra has collaborated with talented individuals such as Shannon W Dunn and Aelan Mosden, contributing to her innovative projects and advancements in technology.

Conclusion

Sandra L Hyland's contributions to the field of materials science and chemical processes are noteworthy. Her innovative patents and collaborations reflect her commitment to advancing technology and overcoming industry challenges.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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