The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2008
Filed:
Nov. 12, 2003
Steven T Fink, Mesa, AZ (US);
Eric J Strang, Chandler, AZ (US);
Arthur H Laflamme, Jr., Rowley, MA (US);
Jay Wallace, Danvers, MA (US);
Sandra Hyland, Falls Church, VA (US);
Steven T Fink, Mesa, AZ (US);
Eric J Strang, Chandler, AZ (US);
Arthur H Laflamme, Jr., Rowley, MA (US);
Jay Wallace, Danvers, MA (US);
Sandra Hyland, Falls Church, VA (US);
Tokyo Electron Limited, , JP;
Abstract
A baffle plate assembly, configured to be coupled to a substrate holder in a plasma processing system, comprises a baffle plate having one or more openings to permit the passage of gas there through, wherein the coupling of the baffle plate to the substrate holder facilitates auto-centering of the baffle plate in the plasma processing system. For example, a centering ring mounted in the substrate holder can comprise a centering feature configured to couple with a mating feature on the baffle plate. After initial assembly of the plasma processing system, the baffle plate can be replaced and centered within the plasma processing system without disassembly and re-assembly of the substrate holder.