The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
May. 31, 2001
Applicant:
Inventors:
Danielle Ki'ilani Kempa, Ogunquit, ME (US);
Sandra Hyland, Falls Church, VA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract
An optical endpoint system controls the overetching of a semiconductor device by using double optical endpoint detection. With a complex spacer, the system monitors the chemistry change at both the top TEOS/nitride interface and the bottom nitride/TEOS interface. This double optical endpoint method reduces the possibility of overetching the layers regardless of the variations in the thickness of the incoming film or the etching characteristics of the etch chamber.