Sameet K Shriyan

Title: Sameet K Shriyan: Innovator in Electron Beam Technology

Introduction

Sameet K Shriyan is a prominent inventor based in San Jose, CA (US). He has made significant contributions to the field of electron beam technology, holding a total of 6 patents. His innovative work focuses on enhancing the capabilities and resolutions of electron beam systems.

Latest Patents

One of his latest patents is titled "Method and system of image-forming multi-electron beams." This invention describes a multi-electron beam system that forms hundreds of beamlets, allowing for focused beamlets that reduce Coulomb interaction effects and improve resolution. Additionally, a Wien filter with electrostatic and magnetic deflection fields is utilized to separate secondary electron beams from primary electron beams, correcting astigmatism and source energy dispersion blurs for all beamlets simultaneously. Another notable patent is "Systems and methods of creating multiple electron beams." This invention features an electron-beam device that includes upper-column and lower-column electron optics. The upper-column electron optics consist of an aperture array that divides an electron beam into multiple beamlets, along with a lens array that adjusts the focus of these beamlets.

Career Highlights

Sameet K Shriyan has worked with notable companies such as KLA-Tencor Corporation and KLA Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies in electron beam systems.

Collaborations

Some of his coworkers include Xinrong Jiang and Christopher Sears, who have collaborated with him on various projects in the field of electron beam technology.

Conclusion

Sameet K Shriyan's contributions to electron beam technology through his patents and career experiences highlight his role as a leading innovator in this specialized field. His work continues to influence advancements in electron beam systems and their applications.