The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
May. 31, 2022
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Xinrong Jiang, Palo Alto, CA (US);
Christopher Sears, Fremont, CA (US);
Youfei Jiang, Milpitas, CA (US);
Sameet K. Shriyan, Milpitas, CA (US);
Jeong Ho Lee, Palo Alto, CA (US);
Michael Steigerwald, Milpitas, CA (US);
Ralph Nyffenegger, Palo Alto, CA (US);
Assignee:
KLA CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/06 (2006.01); H01J 37/12 (2006.01); H01J 37/244 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/06 (2013.01); H01J 37/12 (2013.01); H01J 37/244 (2013.01); H01J 37/28 (2013.01); H01J 2237/0451 (2013.01); H01J 2237/04735 (2013.01); H01J 2237/103 (2013.01); H01J 2237/151 (2013.01); H01J 2237/152 (2013.01); H01J 2237/1532 (2013.01); H01J 2237/1536 (2013.01); H01J 2237/2448 (2013.01);
Abstract
A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.