Jeong Ho Lee

Title: Jeong Ho Lee: Innovator in Multi-Electron Beam Technology

Introduction

Jeong Ho Lee is a prominent inventor based in Palo Alto, CA (US). He has made significant contributions to the field of multi-electron beam technology, holding a total of 3 patents. His innovative work focuses on enhancing the resolution and efficiency of electron beam systems.

Latest Patents

One of his latest patents is titled "Method and system of image-forming multi-electron beams." This invention describes a multi-electron beam system that forms hundreds of beamlets, allowing for focused beamlets that reduce Coulomb interaction effects and improve resolution. Additionally, a Wien filter with electrostatic and magnetic deflection fields is utilized to separate secondary electron beams from primary ones, correcting astigmatism and source energy dispersion blurs for all beamlets simultaneously. Another notable patent is "Shaped aperture set for multi-beam array configurations." This patent provides an aperture array for a multi-beam array system, featuring an array body with multiple apertures of different geometries. The array body can be moved via an actuator relative to the optical axis of the beam source, enabling the selection of a subset of a beam based on the intersecting aperture's geometry.

Career Highlights

Throughout his career, Jeong Ho Lee has worked with notable companies such as KLA Corporation and KLA-Tencor Corporation. His experience in these organizations has allowed him to develop and refine his innovative technologies in the field of electron beams.

Collaborations

Jeong Ho Lee has collaborated with talented individuals in his field, including Sameet K Shriyan and Xinrong Jiang. These collaborations have contributed to the advancement of his research and inventions.

Conclusion

Jeong Ho Lee is a distinguished inventor whose work in multi-electron beam technology has led to significant advancements in the field. His patents reflect his commitment to innovation and excellence in technology.