The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2019

Filed:

May. 17, 2010
Applicant:

Jeong Ho Lee, Palo Alto, CA (US);

Inventor:

Jeong Ho Lee, Palo Alto, CA (US);

Assignee:

KLA-TENCOR CORPORATION, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 7/73 (2017.01); G06T 7/30 (2017.01); G06T 3/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/73 (2017.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30204 (2013.01);
Abstract

One embodiment relates to a method for run-time correction of defect locations on a substrate during defect review. The substrate is loaded into a stage of a review apparatus, and coordinates for the defect locations on the substrate is received. The defect locations are grouped, and at least one local reference site in proximity to each group of defect locations is determined. The local reference site(s) is (are) used to determine a positional offset for the defect locations in each group. Another embodiment relates to an apparatus for reviewing defect locations on a substrate which provides for run-time correction of the defect locations. Other embodiments and features are also disclosed.


Find Patent Forward Citations

Loading…