The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2023

Filed:

Sep. 30, 2021
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventors:

Xinrong Jiang, Palo Alto, CA (US);

Sameet Shriyan, Milpitas, CA (US);

Luca Grella, Gilroy, CA (US);

Kevin Cummings, Milpitas, CA (US);

Christopher Sears, San Jose, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/09 (2006.01); H01J 37/14 (2006.01); H01J 37/21 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/09 (2013.01); H01J 37/14 (2013.01); H01J 37/21 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01);
Abstract

An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.


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