Kla Tencor Corporation

Kla Corporation

Sameet K Shriyan

Christopher Sears

Xinrong Jiang

Jeong Ho Lee

Hong Xiao

Luca Grella

Tomas Plettner

Youfei Jiang

Oscar G Florendo

Ralph Nyffenegger

David Kaz

Michael Steigerwald

Joseph Maurino

Daniel Bui

Kevin Cummings

Ernesto Escorcia

A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.

Method and system of image-forming multi-electron beams

An electron-beam device includes upper-column electron optics and lower-column electron optics. The upper-column electron optics include an aperture array to divide an electron beam into a plurality of electron beamlets. The upper-column electron optics also include a lens array with a plurality of lenses to adjust the focus of the plurality of electron beamlets. Respective lenses of the plurality of lenses are to adjust the focus of respective electron beamlets of the plurality of electron beamlets. The upper-column electron optics further include a first global lens to adjust the focus of the plurality of electron beamlets in a manner opposite to the lens array.

Systems and methods of creating multiple electron beams

An aperture array for a multi-beam array system and a method of selecting a subset of a beam from a multi-beam array system are provided. The aperture array comprises an array body arranged proximate to a beam source. The array body comprises a plurality of apertures, at least two of the apertures having different geometries. The array body is movable, via an actuator, relative to an optical axis of the beam source, such that a subset of a beam from the beam source is selected based on the geometry of the aperture that is intersected by the optical axis.

Shaped aperture set for multi-beam array configurations

These electron beam separator designs address thermally-induced beam drift in an electron-optical system. A heater coil wrapped around the beam separator unit can maintain constant power. Additional coils also can be wrapped around the beam separator in a bifilar manner, which can maintain constant power in the beam separator coils. Wien power can be determined, and then heater coil current can be determined.

Method of eliminating thermally induced beam drift in an electron beam separator

A scanning electron microscopy system is disclosed. The system includes an electron beam source configured to generate a primary electron beam. The system includes a sample stage configured to secure a sample. The system includes a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The set of electron-optical elements includes an upper deflector assembly and a lower deflector assembly. The upper deflector assembly is configured to compensate for chromatic aberration in the primary electron beam caused by the lower deflector assembly. In addition, the system includes a detector assembly configured to detect electrons emanating from the surface of the sample.

Method and system for aberration correction in an electron beam system

A system for measuring cathodoluminescence from a substrate includes an electron beam source configured to generate an electron beam, a sample stage configured to secure a sample and an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through onto a portion of the sample. The system also includes a set of guide optics located at a position within or below the electron-optical column and a set of collection optics, wherein the set of guide optics captures cathodoluminescent light emitted from the sample in response to the electron beam and directs the cathodoluminescent light to the set of collection optics. In addition, the system includes a detector. The set of collection optics is configured to image the cathodoluminescent light onto the detector.

System and method for cathodoluminescence-based semiconductor wafer defect inspection

Growing community of inventors

San Jose, CA, United States of America

Sameet K Shriyan