Portland, OR, United States of America

Sam Sivakumar

This inventor holds 14 USPTO granted patents, primarily in Semiconductor Fabrication. Top assignee: Intel Corporation. Active years: 2000-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sam Sivakumar. Retrieved from https://idiyas.com/inventor/sam-sivakumar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 71.4

Average Co-Inventor Count = 2.9

ph-index = 9

Forward Citations = 267(Granted Patents)


Location History:

  • Hillsboro, OR (US) (2000 - 2004)
  • Portland, OR (US) (2002 - 2010)
  • Beaverton, OR (US) (2023)

Company Filing History:


Years Active: 2000-2023

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Areas of Expertise:
Non-Planar Transistors
Photolithography
Chromeless Phase Shift Masks
Polymeric Interlayer Dielectric
Conductive Line Patterning
Damascene Processing
Electroplating Process
Interconnects
Carbon Doped Oxide
Integrated Circuits
Pattern-Sensitive Deposition
Dual Damascene
14 patents (USPTO):Explore Patents

Title: The Innovative Mind of Sam Sivakumar

Introduction

Sam Sivakumar is a prominent inventor residing in Portland, OR, with an impressive portfolio of 14 patents to his name. His contributions to the field of technology, particularly in transistor design and photolithography, have made significant impacts in the industry. Through his innovative approaches, he continues to push the boundaries of what is possible in semiconductor technology.

Latest Patents

Among the notable patents attributed to Sam Sivakumar are two groundbreaking inventions. The first is related to non-planar transistors with channel regions having varying widths. This innovation provides techniques for creating non-planar transistors that feature channel widths independently varied. These structures are designed with a fin or other configurations like nanowires and nanosheets, allowing for unique attributes such as abrupt changes in width along the fin, which may be implemented in a symmetric or asymmetric fashion.

The second patent addresses diagonal corner-to-corner sub-resolution assist features for photolithography. This technique enhances photolithography masks by synthesizing diagonal features that bridge gaps between main features, significantly improving resolution and design flexibility.

Career Highlights

Sam Sivakumar has made his mark primarily as a dedicated researcher at Intel Corporation. His work has played a crucial role in advancing technologies that form the backbone of modern electronic devices. His research emphasizes innovation in semiconductor devices, contributing to the ongoing evolution of the tech industry.

Collaborations

Throughout his career, Sam has collaborated with fellow inventors and professionals, including Makarem A. Hussein and Paul Anton Nyhus. These partnerships have fostered a creative environment that promotes shared knowledge and advancements in technology.

Conclusion

Sam Sivakumar stands as a testament to the power of innovation in the field of semiconductor technology. With his continued focus on developing cutting-edge inventions, he remains a vital player in shaping the future of electronics and improving device functionality. His patents not only reflect his individual creativity but also highlight the collaborative spirit within the industry that drives progress forward.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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