The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2003
Filed:
Sep. 30, 1998
Peter K. Moon, Portland, OR (US);
Makarem A. Hussein, Beaverton, OR (US);
Alan Myers, Portland, OR (US);
Charles Recchia, Hillsboro, OR (US);
Sam Sivakumar, Hillsboro, OR (US);
Angelo Kandas, Hillsboro, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A method of forming an interconnection including the steps of depositing a first masking material over a first conductive region of an integrated circuit substrate and depositing a dielectric material over the first masking material. The method also includes forming a via through the dielectric material to expose the first masking material and a second masking material is deposited in a portion of the via. A trench is formed in the dielectric material over a portion of the via and the second masking material is removed from the via. The via is then extended through the first masking material and a conductive material is deposited in the via.