Shenzhen, China

Sainan Huai

USPTO Granted Patents = 6 

 

Average Co-Inventor Count = 6.3

ph-index = 1


Location History:

  • Shenzhen, CN (2024)
  • Guangdong, CN (2024)

Company Filing History:


Years Active: 2024-2025

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6 patents (USPTO):Explore Patents

Title: Innovations by Sainan Huai

Introduction

Sainan Huai is a prominent inventor based in Shenzhen, China. He has made significant contributions to the field of circuit structures, particularly in the development of advanced fabrication methods. With a total of 6 patents to his name, Huai continues to push the boundaries of technology.

Latest Patents

One of his latest patents is titled "Method for fabricating air bridge, air bridge structure, and superconducting quantum chip." This invention includes a method for fabricating an air bridge, an air bridge structure, and a superconducting quantum chip. The method involves forming an air bridge brace structure on a substrate and creating an air bridge material layer with openings that reveal the brace structure. This innovative approach enhances the efficiency of circuit structures. Another notable patent is the "Photoresist removal method and photoresist removal system." This application outlines a comprehensive process for removing photoresist from a target wafer, utilizing ultrasonic cleaning and drying techniques to ensure optimal results.

Career Highlights

Sainan Huai has worked with notable organizations such as Tencent Technology (Shenzhen) Company Limited and the Chinese Academy of Sciences. His experience in these institutions has allowed him to collaborate on various cutting-edge projects, furthering his expertise in the field.

Collaborations

Throughout his career, Huai has collaborated with talented individuals, including Yu Zhou and Zhenxing Zhang. These partnerships have contributed to the success of his innovative projects and patents.

Conclusion

Sainan Huai is a distinguished inventor whose work in circuit structures and fabrication methods has made a significant impact in the field. His ongoing contributions and collaborations continue to inspire advancements in technology.

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