Rüdiger Schmolke

Title: Rüdiger Schmolke: Innovator in Semiconducting Materials

Introduction

Rüdiger Schmolke is a notable inventor based in Burghausen, Germany. He has made significant contributions to the field of semiconducting materials, holding three patents that showcase his innovative approach to technology.

Latest Patents

Schmolke's latest patents include a film or layer of semiconducting material and a process for producing this film or layer. This invention focuses on manufacturing SOI wafers with very thin device layers that exhibit high surface quality. The layer is less than or equal to 20 nm in thickness, with an HF density of less than or equal to 0.1/cm and a surface roughness of 0.2 nm RMS. Another patent involves a film or layer made of semi-conductive material with low defect density in the thin layer. This invention also relates to a SOI-disk featuring a thin silicon layer that demonstrates low surface roughness, defect density, and thickness variations. The method for producing this film or layer includes several steps, such as producing structures from semi-conductive material with periodically repeated recesses and thermally treating the surface structured material.

Career Highlights

Rüdiger Schmolke is currently associated with Siltronic AG, a leading company in the semiconductor industry. His work has significantly advanced the production techniques and quality of semiconducting materials.

Collaborations

Some of his notable coworkers include Wilfried Von Ammon and Brian Murphy, who have collaborated with him on various projects within the field.

Conclusion

Rüdiger Schmolke's contributions to the field of semiconducting materials through his innovative patents and work at Siltronic AG highlight his importance as an inventor. His advancements continue to influence the semiconductor industry significantly.