This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Panasonic Corporation. Active years: 2010-2013.
Company Filing History:
Years Active: 2010-2013
Title: Ryuzou Houchin: Innovator in Plasma Processing Technology
Introduction
Ryuzou Houchin is a prominent inventor based in Osaka, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work has been instrumental in advancing methods and apparatuses used in semiconductor manufacturing.
Latest Patents
Houchin's latest patents include a plasma processing apparatus and a plasma processing method. The plasma processing apparatus features a tray designed for a dry etching apparatus, which includes substrate accommodation holes and a substrate support portion. This innovative design allows for efficient handling and processing of substrates during semiconductor fabrication. Another notable patent is the wafer reclamation method and apparatus, which focuses on reclaiming semiconductor wafers by removing different material layers. This method involves physically removing the unwanted layer, forming a new film on the wafer's surface, and etching the wafer using plasma.
Career Highlights
Houchin is currently employed at Panasonic Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise in plasma processing has positioned him as a key figure in the advancement of manufacturing techniques.
Collaborations
Throughout his career, Houchin has collaborated with notable colleagues, including Shogo Okita and Hiroyuki Suzuki. These partnerships have fostered innovation and contributed to the successful development of various technologies.
Conclusion
Ryuzou Houchin's contributions to plasma processing technology have had a lasting impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.