The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2013
Filed:
Jun. 20, 2012
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Ryuzou Houchin, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Ryuzou Houchin, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A tray for a dry etching apparatus includes substrate accommodation holes penetrating a thickness direction and a substrate support portion supporting an outer peripheral edge portion of a lower surface of a substrate. An upper portion includes a tray support surface supporting a lower surface of the tray, substrate placement portions on each of which a lower surface of the substrate to be placed, and a concave portion for accommodating the substrate support portion. A dc voltage applying mechanism applies a dc voltage to an electrostatic attraction electrode. A heat conduction gas supply mechanism supplies a heat conduction gas between the substrate and substrate placement portion. During carrying of the substrate, the outer peripheral edge of the lower surface of the substrate is supported by the substrate accommodation hole. During processing of the substrate, the substrate support portion is accommodated in the concave portion.