The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2012
Filed:
Oct. 14, 2009
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Ryuzou Houchin, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Ryuzou Houchin, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A tray for a dry etching apparatus includes substrate accommodation holes penetrating a thickness direction and a substrate support portion supporting an outer peripheral edge portion of a lower surface of a substrate. A dielectric plate includes a tray support surface supporting a lower surface of the tray, substrate placement portions inserted from a lower surface side of the tray into the substrate accommodation holes and having a substrate placement surface at its upper end surface. A dc voltage applying mechanism applies a dc voltage to an electrostatic attraction electrode. A heat conduction gas supply mechanism supplies a heat conduction gas between the substrate and substrate placement surface. The substrate is retained on the substrate placement surface with high degree of adhesion. Cooling efficiency of the substrate is improved and processing is uniform at the entire region of the substrate surface.