The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
Oct. 10, 2006
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Ryuzou Houchin, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Shogo Okita, Hyogo, JP;
Hiromi Asakura, Hyogo, JP;
Syouzou Watanabe, Osaka, JP;
Ryuzou Houchin, Osaka, JP;
Hiroyuki Suzuki, Osaka, JP;
Panasonic Corporation, Osaka, JP;
Abstract
A trayfor a dry etching apparatushas substrate accommodation holesA toD penetrating thickness direction and a substrate support portionsupporting an outer peripheral edge portion of a lower surfaceof a substrate. A dielectric platehas a tray support surfacesupporting a lower surface of the tray, substrate placement portionsA throughD inserted from a lower surface side of the trayinto the substrate accommodation holesA throughD and having a substrate placement surfaceat its upper end surface for placing the substrate. A dc voltage applying mechanismapplies a dc voltage to an electrostatic attraction electrode. A heat conduction gas supply mechanismsupplies a heat conduction gas between the substrateand substrate placement surface. The substratecan be retained on the substrate placement surfacewith high degree of adhesion. This results in that the cooling efficiency of the substrateis improved and processing is uniformed at the entire region of the substrate surface including the vicinity of the outer peripheral edge.