Tokyo, Japan

Ryuichi Tanimoto

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2012-2023

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9 patents (USPTO):Explore Patents

Title: Ryuichi Tanimoto: Innovator in Wafer Polishing Technology

Introduction

Ryuichi Tanimoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in wafer polishing technology. With a total of nine patents to his name, Tanimoto's innovations have advanced the efficiency and effectiveness of wafer processing.

Latest Patents

One of Tanimoto's latest patents is the "Wafer Edge Polishing Apparatus and Method." This invention features a cleaning mechanism that effectively removes slurry residue from a chuck table. The apparatus includes a chuck table that holds a wafer, a rotation drive mechanism for rotating the chuck table, and an edge polishing unit that polishes the wafer's edge while supplying slurry. Additionally, a cleaning unit equipped with a high-pressure cleaning head ensures the chuck table remains clean.

Another notable patent is the "Method of Double-Side Polishing Silicon Wafer." This method involves a series of steps for double-side polishing a silicon wafer using a specialized apparatus. The process includes a first polishing step with an alkaline aqueous solution containing abrasive grains, followed by a polishing agent switching step, and concludes with a second polishing step using a different polishing agent.

Career Highlights

Throughout his career, Ryuichi Tanimoto has worked with reputable companies such as Sumco Corporation and Nitta Haas Inc. His experience in these organizations has allowed him to refine his skills and contribute to the development of advanced wafer polishing technologies.

Collaborations

Tanimoto has collaborated with notable coworkers, including Shinichi Ogata and Shunsuke Mikuriya. These partnerships have fostered innovation and have been instrumental in the successful development of his patented technologies.

Conclusion

Ryuichi Tanimoto's contributions to wafer polishing technology have made a significant impact in the semiconductor industry. His innovative patents and collaborations highlight his dedication to advancing manufacturing processes. Tanimoto's work continues to influence the field, ensuring higher efficiency and quality in wafer production.

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