Ryoji Ikebe is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 7 patents. His innovative work focuses on improving measurement and analysis processes in substrate processing systems.

Latest Patents

Among his latest patents, Ikebe has developed a substrate processing system that includes a measurement processing process for measuring the cut width of a film. This process utilizes an imaging unit to capture an image of the peripheral portion of a substrate, which is processed according to a substrate processing recipe. Additionally, he has created a management list that correlates the set value of the cut width, the measured value, and the time information when the measurement result is obtained. His analysis process allows for the evaluation of the processed substrate's state based on the management list, while a notification process provides preset alerts to users based on the analysis results.

Career Highlights

Ryoji Ikebe is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics industry. His work at the company has been instrumental in advancing substrate processing technologies, making significant impacts on manufacturing efficiency and quality.

Collaborations

Ikebe has collaborated with notable coworkers, including Satoshi Morita and Yoshifumi Amano. Their combined expertise has contributed to the development of innovative solutions in the field.

Conclusion

Ryoji Ikebe's contributions to substrate processing technology exemplify the importance of innovation in the electronics industry. His patents and collaborative efforts continue to shape advancements in this critical area of technology.

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