Ryan O Jung

Title: Innovations and Contributions of Ryan O Jung

Introduction

Ryan O Jung, a prominent inventor based in Rensselaer, NY, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 23 patents, he has demonstrated a consistent ability to innovate and improve upon existing processes and structures used in device fabrication.

Latest Patents

Among his recent patents, Ryan O Jung has developed a method for a gate cut with high selectivity to preserve the interlevel dielectric layer. This innovative approach involves recessing a dielectric fill to expose the cap layers of gate structures and forming a liner in the recess to protect the dielectric fill during etching. This method ensures that the dielectric fill remains intact while allowing for the formation of a gate recess, ultimately providing a more efficient process in semiconductor manufacturing.

Another notable patent focuses on a method and structure for enabling high aspect ratio sacrificial gates. This patent describes the formation of sacrificial gate structures with an aspect ratio greater than 5:1 on a substrate. Each structure is designed to anchor orthogonally, resulting in enhanced mechanical stability. Following the formation of a planarization dielectric layer, these sacrificial gate structures can be effectively replaced with functional gate structures, showcasing a significant advancement in the fabrication techniques used in semiconductor devices.

Career Highlights

Ryan's expertise and innovative approach have led him to work with prestigious companies such as IBM and GlobalFoundries Inc. His work within these organizations has allowed him to collaborate with leading professionals in the field of semiconductor technology and to further his contributions to the industry.

Collaborations

Throughout his career, Ryan has had the opportunity to collaborate with talented coworkers, including Kangguo Cheng and Fee Li Lie. These partnerships have enhanced his research and development efforts, fostering a productive environment for innovation.

Conclusion

In summary, Ryan O Jung stands out as a leading inventor in semiconductor technology, with a strong track record of patented innovations. His work not only advances the field but also exemplifies the spirit of collaboration and continuous improvement that drives technological progress.