Plano, TX, United States of America

Robert R Doering

USPTO Granted Patents = 36 

 

Average Co-Inventor Count = 3.0

ph-index = 13

Forward Citations = 422(Granted Patents)


Location History:

  • Plano, TX (US) (1985 - 2006)
  • Garland, TX (US) (2014 - 2024)

Company Filing History:


Years Active: 1985-2024

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36 patents (USPTO):

Title: Innovations in Integrated Circuits: The Work of Robert R. Doering

Introduction

Robert R. Doering is a notable inventor based in Plano, Texas, recognized for his significant contributions to the field of integrated circuits. With an impressive portfolio of 36 patents, Doering has been at the forefront of advancements in semiconductor technology.

Latest Patents

Among his recent innovations are two groundbreaking patents focusing on thermal management within integrated circuits. The first patent, titled **"Thermal routing trench by additive processing,"** introduces an integrated circuit featuring a substrate composed of semiconductor material alongside an interconnect region. This innovative design includes a thermal routing trench that integrates a cohered nanoparticle film, enhancing thermal conductivity beyond that of the semiconductor material. Notably, this film is formed through an additive process, signifying a leap in manufacturing techniques.

The second patent, **"High thermal conductivity vias by additive processing,"** relates to a thermal via embedded in the interconnect region of an integrated circuit. This via extends vertically within the interconnect levels and also utilizes a cohered nanoparticle film to provide superior thermal conductivity compared to the dielectric material it contacts. This patent furthers the understanding of thermal management in electronic devices.

Career Highlights

Robert R. Doering has dedicated his career to Texas Instruments Corporation, a leader in semiconductor design and manufacturing. His role in the company has been pivotal, leading to substantial advancements in the functionality and efficiency of integrated circuits.

Collaborations

During his tenure at Texas Instruments, Doering has collaborated with esteemed colleagues, including Luigi Colombo and Archana Venugopal. This teamwork has been instrumental in propelling innovative solutions in semiconductor technology, pushing the boundaries of what is possible in integrated circuit design.

Conclusion

Robert R. Doering's contributions to the field of integrated circuits exemplify the spirit of innovation in technology. With a strong focus on thermal management through advanced materials and manufacturing techniques, his work not only enhances the performance of electronic devices but also sets the stage for future advancements in semiconductor technology.

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