Company Filing History:
Years Active: 2006-2020
Title: Richard Janek: Innovator in Atomic Layer Etching
Introduction
Richard Janek is a prominent inventor based in Oakland, CA (US), known for his significant contributions to the field of atomic layer etching (ALE). With a total of 9 patents to his name, Janek has developed innovative methods that enhance the precision and efficiency of substrate processing.
Latest Patents
Janek's latest patents include groundbreaking techniques in atomic layer etching. One notable patent describes a method for performing ALE on a substrate, which involves a series of operations. These operations include a surface modification step that converts a monolayer of the substrate surface into a modified layer. Following this, a removal operation is executed to eliminate the modified layer, utilizing a metal complex to facilitate a ligand exchange reaction. The process is completed with a plasma treatment that removes any residues, and these steps are repeated until the desired thickness is achieved.
Another significant patent focuses on controlling directionality in atomic layer etching. This method also begins with a surface modification operation, where a bias voltage is applied to regulate the depth of the substrate surface conversion. The removal operation then employs thermal energy to desorb portions of the modified layer, followed by a plasma treatment to clear residues from the substrate surface.
Career Highlights
Throughout his career, Richard Janek has worked with esteemed organizations such as Lam Research Corporation and Sandia National Laboratories. His experience in these companies has allowed him to refine his expertise in atomic layer etching and contribute to advancements in semiconductor manufacturing.
Collaborations
Janek has collaborated with notable colleagues, including Thorsten B. Lill and Andreas Fischer. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of atomic layer etching.
Conclusion
Richard Janek's contributions to atomic layer etching through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in substrate processing technologies.