The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2015
Filed:
Jul. 08, 2014
Lam Research Corporation, Fremont, CA (US);
Meihua Shen, Fremont, CA (US);
Harmeet Singh, Fremont, CA (US);
Samantha S. H. Tan, Fremont, CA (US);
Jeffrey Marks, Saratoga, CA (US);
Thorsten Lill, Santa Clara, CA (US);
Richard P. Janek, Oakland, CA (US);
Wenbing Yang, Fremont, CA (US);
Prithu Sharma, Santa Clara, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for etching a stack with at least one metal layer in one or more cycles is provided. An initiation step is preformed, transforming part of the at least one metal layer into metal oxide, metal halide, or lattice damaged metallic sites. A reactive step is performed providing one or more cycles, where each cycle comprises providing an organic solvent vapor to form a solvated metal, metal halide, or metal oxide state and providing an organic ligand solvent to form volatile organometallic compounds. A desorption of the volatile organometallic compounds is performed.