This inventor holds 5 USPTO granted patents. Top assignees: General Signal Corporation, Uvtech Systems, Inc., Excimer Laser Systems. Active years: 1991-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991-1998
Title: The Innovative Journey of Richard F. Hollman
Introduction
Richard F. Hollman, an inventive spirit from Chelmsford, MA, has significantly contributed to the field of surface cleaning technology. With a remarkable portfolio of five patents, Hollman's innovations focus on photoreactive processes that enhance cleaning methods without damaging the surfaces involved. His groundbreaking work showcases the intersection of chemistry, physics, and engineering.
Latest Patents
Hollman's latest patents illustrate his pioneering methods for cleaning substrates through innovative techniques. One noteworthy patent is the method for photoreactive surface cleaning. This involves processing foreign materials on a substrate's surface to create a non-solid by-product. By utilizing a gaseous reactant in close proximity to the foreign material and a beam of radiation, Hollman effectively facilitates a reaction that cleans the surface. Furthermore, a laser configured to emit an initial beam of ultraviolet radiation, coupled with specialized optics, shapes the beam to target the surface precisely, resulting in efficient cleaning.
Another key patent is the technique for photoreactive surface processing. In this method, Hollman employs a laser beam of ultraviolet radiation, which strikes the substrate at an acute angle. This configuration allows for a long, narrow reaction region where the beam and substrate move relative to each other, sweeping the surface. During this process, the reactant gas is excited by the UV laser beam, ensuring effective removal of foreign materials without damaging the substrate or leaving residues.
Career Highlights
Richard F. Hollman has demonstrated an impressive trajectory in his career, having worked with notable companies including Uvtech Systems, Inc. and General Signal Corporation. His contributions to these organizations have facilitated advancements in technology related to surface cleaning and processing, further establishing his reputation as an innovative inventor.
Collaborations
Throughout his career, Hollman has collaborated with esteemed professionals such as David J. Elliott and Francis M. Yans. These partnerships have enabled the exchange of ideas and insights, fostering a collaborative environment that has propelled advancements in their combined fields of expertise.
Conclusion
Richard F. Hollman's commitment to innovation and his numerous patents underscore his status as an influential inventor in the realm of surface cleaning technology. His groundbreaking methods, particularly in photoreactive cleaning processes, exemplify the potential for scientific advancements to revolutionize industry practices while prioritizing the integrity of substrates. As he continues to innovate, the legacy of his work is poised to impact the field for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile