The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 1996
Filed:
Oct. 04, 1994
David J Elliott, Wayland, MA (US);
Richard F Hollman, Chelmsford, MA (US);
David Shafer, Fairfield, CT (US);
Excimer Laser Systems, Inc., Wayland, MA (US);
Abstract
A high resolution, deep UV beam delivery system for exposing a surface, directly or through a mask, for the purpose of photolithography, surface cleaning, microstructuring, pattern microimaging, surface modification or the like, the delivery system including a deep UV radiation source for generating a beam of narrow wavelength deep ultraviolet radiation along a path, a first optical system in the path for homogenizing and shaping the deep UV energy in the path; and a second optical system in the path for directing radiation energy onto the surface of a substrate to be processed, the second optical system including large area mirror structure having a numerical aperture of at least 0.3 and a modular compensation assembly of refractive elements disposed between said large area mirror structure and said substrate and corresponding to the wavelength of the radiation source for compensating (reducing) image curvature introduced into the system by the large area mirror structure.