The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 1998

Filed:

Nov. 12, 1996
Applicant:
Inventors:

David J Elliott, Wayland, MA (US);

Richard F Hollman, Chelmsford, MA (US);

Assignee:

UVTech Systems Inc., Wayland, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134 19 ; 134201 ;
Abstract

Foreign material on a surface of a substrate is processed to form a non-solid by-product by providing a gaseous reactant in the vicinity of the foreign material and delivering a beam of radiation to aid the gaseous reactant to react with the foreign material to form the non-solid by-product. In another aspect, radiation for cleaning a surface of a substrate is provided by a laser configured to deliver an original beam of ultraviolet radiation, and optics (e.g., a pair of orthogonal cylindrical mirrors) for shaping the beam to have a cross-section in the form of a line having a width smaller than any dimension of a cross-section of the original beam and a length at least ten times larger than any dimension of the original beam.


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