The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 1994

Filed:

Apr. 02, 1993
Applicant:
Inventor:

Richard F Hollman, Chelmsford, MA (US);

Assignee:

General Signal Corporation, Stamford, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 53 ; 355 67 ; 355 71 ;
Abstract

In the microlithographic projection system disclosed herein, a reticle whose image is to be projected is illuminated with light having an essentially uniform intensity distribution over the reticle and angular distribution which is annularly concentrated. The annular concentration is produced by a phase grating interposed between the light source and a kaleidoscope which generates multiple overlapping images of this light source. The grating employs an array of elements of differing transmission phasings which suppresses zero order transmission and concentrates incident energy in an annularly diverging beam array.


Find Patent Forward Citations

Hollman, Richard. (1994). Microlithographic projection system (U.S. Patent No. 5359388). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5359388

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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