The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 1991
Filed:
Jun. 18, 1990
Richard F Hollman, Chelmsford, MA (US);
General Signal Corporation, Stamford, CT (US);
Abstract
The method of exposure control disclosed herein is particularly applicable to the pulsed laser illumination of photosensitive resists. The relative illuminating energy provided by successive laser pulses is measured and the successive measurements are accumulated. When the accumulated value appraoches the desired exposure level within a preselected difference, an attenuator is inserted in the optical path between the laser and the resist thereby to reduce the exposing energy provided by each pulse to a value below the acceptable deviation. The exposure is terminated when the accumulated value effectively reaches the desired exposure level.
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