Boise, ID, United States of America

Rene Marinus Gerardus Johan Queens


Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 131(Granted Patents)


Location History:

  • Eindhoven, NL (2005 - 2010)
  • Boise, ID (US) (2019 - 2022)

Company Filing History:


Years Active: 2005-2022

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12 patents (USPTO):

Title: René Marinus Gerardus Johan Queens: Innovating Lithographic Technology

Introduction:

René Marinus Gerardus Johan Queens, a prolific inventor based in Boise, ID (US), has made significant contributions to the field of lithographic technology. With an impressive portfolio of 12 patents, René Queens is known for his innovative systems and methods for alignment measurement in substrate manufacturing.

Latest Patents:

René Queens' latest patents showcase his expertise in the field:

1. System and Method for Measurement of Alignment: This patent introduces a novel system that utilizes a topography measurement system to determine alignment parameters for substrates. By comparing height maps and reference data, this system enhances the accuracy of alignment processes.

2. Methods for Controlling Lithographic Apparatus: This patent focuses on optimizing lithographic processes by selectively addressing topographical variations across substrates. By controlling imaging at different field locations, this method improves the efficiency of device manufacturing.

Career Highlights:

René Queens has brought his innovative ideas to companies like ASML Netherlands B.V. (ASML) and ASML Netherlands B.V. (ASML). Through his work, René has elevated lithographic technology to new heights, contributing to advancements in device manufacturing processes.

Collaborations:

Throughout his career, René Queens has collaborated with industry experts such as Paulus Antonius Andreas Teunissen and Wolfgang Helmut Henke. These collaborations have led to the development of cutting-edge technologies and have cemented René's reputation as a forward-thinker in the field.

Conclusion:

René Marinus Gerardus Johan Queens' dedication to innovation and his groundbreaking work in lithographic technology have established him as a pioneer in the field. With a keen eye for detail and a drive for excellence, René continues to push the boundaries of technological advancement, shaping the future of substrate manufacturing.

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