The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2006
Filed:
Jul. 16, 2004
Paulus Antonius Andreas Teunissen, Eindhoven, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Rene Marinus Gerardus Johan Queens, Eindhoven, NL;
Frank Staals, Eindhoven, NL;
Robert Jan Van Wijk, Valkenswaard, NL;
Roeland Nicolaas Maria Vanneer, Eindhoven, NL;
Paulus Antonius Andreas Teunissen, Eindhoven, NL;
Gerrit Johannes Nijmeijer, Eindhoven, NL;
Rene Marinus Gerardus Johan Queens, Eindhoven, NL;
Frank Staals, Eindhoven, NL;
Robert Jan Van Wijk, Valkenswaard, NL;
Roeland Nicolaas Maria Vanneer, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
According to one embodiment, a method of calibrating level sensors of at least two lithographic projection apparatus to correct machine to machine level sensor process dependency includes using a first lithographic projection apparatus to measure a first set of leveling data for a reference substrate and a second set of leveling data for a substrate processed according to a selected process, and using a second lithographic projection apparatus to measure a third set of leveling data for the reference substrate and a fourth set of leveling data for the processed substrate. The method also includes calculating, based on the first, second, third and fourth sets of leveling data, a set of level sensor parameters corresponding to machine to machine level sensor differences for the selected process, wherein the machine to machine level sensor differences are measured and stored as intrafield values.