Reiko Kimura

Title: The Innovative Mind of Reiko Kimura

Introduction

Reiko Kimura, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of materials science, particularly through her innovative patents. With a total of seven patents to her name, she has developed groundbreaking methods that enhance the process of pattern formation in radiation-sensitive resin compositions.

Latest Patents

Among her latest patents is a resist pattern-forming method that involves coating a radiation-sensitive resin composition onto a substrate to create a resist film. The resist film undergoes exposure and is then developed with a specialized developer solution containing at least 80% by mass of an organic solvent. This composition features a polymer that incorporates an acid-labile group, alongside a unique acid diffusion controller consisting of a compound with an amide group. Notably, the polymer has a weight average molecular weight exceeding 6,000, ensuring robustness and effectiveness in the development process.

Another recent patent outlines a similar pattern-forming method that utilizes a first polymer with an acid-labile and an alicyclic group. The alicyclic group is crucial as it prevents dissociation from the molecular chain under acidic conditions. This inventive approach highlights her focus on enhancing the quality and stability of the resist patterns used in various applications.

Career Highlights

Reiko Kimura has worked at JSR Corporation and JSP Corporation, where she applied her innovative ideas to real-world challenges in the industry. Her experience in these reputable companies has allowed her to refine her skills and collaborate with other experts in the field.

Collaborations

Throughout her career, Kimura has collaborated with notable colleagues such as Masafumi Hori and Hiromitsu Nakashima. These partnerships have fostered a creative environment, driving forward innovative solutions in the field of resin compositions and pattern formation.

Conclusion

Reiko Kimura's contributions to the realm of inventions, particularly in resist pattern-forming methods, underscore her status as a trailblazer in her field. With seven patents that demonstrate her innovative spirit and commitment to advancements in materials science, she continues to shape the future of technology through her groundbreaking work.