Beaverton, OR, United States of America

R Scott List


Average Co-Inventor Count = 3.2

ph-index = 17

Forward Citations = 3,967(Granted Patents)


Company Filing History:


Years Active: 2003-2010

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39 patents (USPTO):Explore Patents

Title: R Scott List: Innovating Microelectronics in Beaverton, OR

Introduction

R Scott List is a prominent inventor based in Beaverton, Oregon, known for his significant contributions to the field of microelectronics. With an impressive portfolio of 39 patents, he has made remarkable strides in developing technologies that enhance the performance and cooling of electronic devices.

Latest Patents

Among his latest innovations, R Scott List has focused on the following patents:

1. **Cooling Micro-Channels**: This patent describes an apparatus designed for cooling active electronic devices using micro-channels or micro-trenches. The technology aims to improve the efficiency of microelectronic components through enhanced thermal management.

2. **Integrated Re-combiner for Electroosmotic Pumps Using Porous Frits**: This innovative system features trenches coated with a catalyst to remove oxygen or hydrogen from fluids used for cooling. The design facilitates electroosmotic pumping, enhancing the effectiveness of heat removal in microelectronic systems.

Career Highlights

R Scott List currently works at Intel Corporation, a leading multinational technology company renowned for its innovations in semiconductor manufacturing. His work at Intel has propelled advancements in microelectronic technologies, reinforcing the company's position at the forefront of the tech industry.

Collaborations

Throughout his career, R Scott List has collaborated with numerous talented individuals, including his esteemed colleagues Sarah E Kim and Alan M Myers. These partnerships have fostered innovative ideas and have significantly contributed to the development of his patented technologies.

Conclusion

R Scott List's innovations demonstrate his dedication to advancing microelectronics and improving cooling technologies. As he continues to work with leading experts in the field, his contributions are expected to pave the way for future breakthroughs in electronic device performance.

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