The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Sep. 24, 2003
Sarah E. Kim, Portland, OR (US);
R. Scott List, Beaverton, OR (US);
James G. Maveety, San Jose, CA (US);
Alan M. Myers, Portland, OR (US);
Quat T. VU, Santa Clara, CA (US);
Sarah E. Kim, Portland, OR (US);
R. Scott List, Beaverton, OR (US);
James G. Maveety, San Jose, CA (US);
Alan M. Myers, Portland, OR (US);
Quat T. Vu, Santa Clara, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
Trenches may be formed in the upper surfaces of a pair of wafers. Each trench may be coated with a catalyst that is capable of removing oxygen or hydrogen from a fluid used for cooling in a system making use of the electroosmotic effect for pumping. Channels may be formed to communicate fluid to and from the trench coated with the catalyst. The substrates may be combined in face-to-face abutment, for example using copper-to-copper bonding to form a re-combiner.